you can measure the thickness by xrd but this will not be exact which you want. For accurate thichness measurement, i suggest you just create a step by any way of masking during the deposition of your film. and measure this by AFM or surface profiler.
you can measure the thickness by xrd but this will not be exact which you want. For accurate thichness measurement, i suggest you just create a step by any way of masking during the deposition of your film. and measure this by AFM or surface profiler.
Hi, you could use X-ray reflectivity technique to calculate the thickness of the films, if your film surface is smooth enough. You could calculate the thickness of the films by measuring the distance between the adjacent trough of Kiessig fringes, which is plotted in q-space: t = 2*3.14/ DeltaQ
if your film is thin enough to see the broad XRD peak of your glass substrate then,
a) repeate your XRD measurement on pure glass as reference diffractogram,
b) identify the peak heights of your glass peak from your reference Go and your film Gf diffractogram,
c) calculate Gf/Go; so you will have an estimate of x-ray attenuation by your film.
d) then apply Gf/Go=exp(-µ*2*d/sin(theta)); put in your theta and the linear x-ray attenuation coefficient µ (for your X-ray energy) of your film material and resolve the equation for d, the thickness of the film.
You may take your µ from the XCOM data base; as density please take the bulk value of SnS2 as an estimate.
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You will get for 8keV (0.008MeV): µ/r(SnS2)=195,5cm²/g
Taking a density of 4,5g/cm³ you will end up with
µ(SnS2@8keV) =195,5*4,5=880/cm
Please see the derivation of the above formula at my answer of a recent similar question here on RG.