We intend to make a tri-layer thin film deposition in a thermal evaporation chamber (metal-insulator-metal), but we would like to avoid oxygen in order to protect the metal layers from oxidation. Is there any material suitable for a tungsten or alumina boat?
Hello sir.
You can try Chromium. Chromium metal left standing in air is passivated by oxidation, forming a thin, protective, surface layer .
You can easily deposit chromium using thermal evaporator with use of tungsten boat.
Is your insulating different ?
If you have two boat system then follow these steps
1. First deposit Au or Ag layer.
2. Deposit insulating layer using second boat.
3. again deposit Au or Ag layer.
if you are using metal oxide as insulating layer .
1. Deposit Al layer
2. open the vacuum chamber , so surface of Al become Al2O3 .
3. Again deposite Al layer. but this method is not good as you have to run system two times.
Your question is not clear in many senses as was pointed out by Volker.
As an insulator you can try thermally evaporated silicon monoxide (SiO, tungsten boat is good) but please be advised that this material tends to create pin-holes in the layer, and some tricks like using
"Baffled Box Sources" - try to google this topic - might be useful.
MoOx could be conducting after the evaporation, though I don't have an experience. Both SiNx and AlNx are good, but I'm afraid they hardly can be restively evaporated..
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