Dear Sirs and Madams,

I am contacting you because i had a problem during the lift-off process on a SU-8 layer.

First of all, the SU-8 is deposited onto the surface of the substrate using a spin-coater. Then, i have used lift-off process using AZ5214 photoresist  in order to realize our sensor onto the SU-8 layer.

Following the deposition of the metal layers (20 nm of chromium Cr/80 nm of gold Au), i had a problem : when i have put the wafer in an acetone bath to remove the remaining AZ5214 photoresist, all the metal layer was  eliminated.

The question which needs to be asked is therefore whether AZ5214 photoresist can cause problems with the SU-8 photoresist layer ?

And finally, could you  tell me please the solution, in order to resolve this problem ?

Thank you in advance for your response and for your help.

Best regards