Hi Manoj. Are you traying to pattern FTO covered glass?

I made simple patterning in FTO with kapton tape, Zn powder and HCl. You also can use the same process with ITO covered glass.

This is a good example: https://www.ossila.com/products/fto-glass-unpatterned#FTO-Glass-Etch.

To make more complex patterns you can use photolithography, using a photoresine.

just cover the area you wish to each with a fair quantity of fine Zn powder mesh and drop HCl (5M) on it, wait for a few minute and then rinse with water. The previously mentioned Kapton technique and permanent marker pens will produce relatively regular pattern but not good enough as it's a manual process so instead you should use photo lithography.

Hi Alejandro Koffman-Frischknecht , thanks for answer,

Actually, we have to use FTO as gate electrode in photodetector (mosfet structure).

Hi Manoj Yadav

we have quite good and experienced laser process for FTO lay etching and patterning, including ITO and other conductive coatings

we could make micron line width of complicated patterns,please let me know if it helps

this is widely used in thin film solar cell and touch panel manufacturing