How to do Ar treatment using sputter?

28 May 2023 1 6K Report

I would like to do Ar plasma treatment to the TFT device where Al2O3 is passivated.

Now, we have a sputter in our lab that we use to deposit electrodes, and I want to use it to do only Ar plasma treatment on top of Al2O3

What is the method?

I'm going to apply 30sccm 100w 0.25A without opening the Gun target, is this correct?

Ma'Mon Abu Hammad

To perform Ar plasma treatment on top of the Al2O3 passivation layer using a sputter in your lab, here's a suggested method:

Prepare the sputtering system:Ensure that the sputtering system is clean and free from any residual material. Verify that the Al2O3 passivated TFT device is securely positioned in the sputtering chamber.

Adjust the process parameters:Set the Ar flow rate to 30 standard cubic centimeters per minute (sccm). This determines the amount of Ar gas flowing into the chamber during the treatment. Set the power to 100 watts (W). This determines the energy provided to the plasma. Set the current to 0.25 amperes (A). This controls the current flowing through the system.

Start the Ar plasma treatment:Close the chamber and ensure it is properly sealed. Start the sputtering system, and the plasma will be generated within the chamber due to the Ar gas and applied power. Allow the Ar plasma treatment to proceed for the desired duration. The duration depends on the specific requirements of your experiment or the literature recommendations.

Monitor the treatment process:Keep an eye on the plasma discharge to ensure it is stable and uniform. Monitor any changes in temperature or pressure inside the chamber to ensure they remain within the acceptable range for your TFT device.

End the Ar plasma treatment:Once the desired treatment duration is reached, stop the sputtering system to terminate the plasma generation. Carefully open the chamber and remove the treated TFT device.

Please note that the specific parameters for Ar plasma treatment can vary depending on the equipment, the TFT device design, and the desired treatment goals. It is recommended to consult any equipment manuals or seek guidance from experienced researchers or lab technicians familiar with the sputtering system you are using. They can provide valuable insights and ensure that the chosen parameters align with your experimental needs.

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