It is widely know that physically a short beam size means better resolution because of the bean spread. This is a major argument for TKD (transmission Kikuchi diffraction) in SEM , however it was already a main argument for EBSD and it is for the maximum resolution for SEM imaging. On the other hand, typical working distances for EBSD are 18-22 mm which is quite big, and also for these investigations step widths of down to 20nm has been used years ago in order to resolve the microstructure of Cu interconnects in semiconductor devices.
Is there any paper which give a rule how the beam diameter changes with the working distance? Is it really that much different to work at 3 or 10mm with TKD or EBSD? I am sure there is a difference but how big is it?
Or is it like with the tilt of TKD samples where 20 degrees only change the beam size ration by 6% which is from my point of view negligible compared to EBSD (290%) and the practically always occurring astigmatism of the beam?