I want to fabricate ZnO thin film on a flexible PEN substrate using RF sputtering technique. Is there any specific target material to be used for getting ZnO film?
Using a metallic Zn target and doind reactive sputtering in Ar+O2, or 100 % O2 sputtering gas ambient is the best option. It is cheapest and most reliable option compared oxide powder targets, which are costly, become oxygen deficient after a couple of sputtering runs, and also tend to crACK.
Dear
you cab get by direct method via using ZnO target and indirect by using zinc metal
You can use direct ZnO material for preparing of thin film by layer deposition
Metallic Zn target should be preferred as oxides targets offer Lower deposition rates.
In order to get a thin film of zinc oxide, the target must be zinc
1- During the sputring process, we enter the oxygen
2 - Déposition of Zn and then the oxidation process
Bonjour,
alors tu dois utiliser une cible de Zn, avec de l'oxygène comme gaz réactif
Si non après dépôt tu fais oxydation
ZnO target is available. Link: https://www.sigmaaldrich.com/IN/en/product/aldrich/752681?gclid=Cj0KCQjwspKUBhCvARIsAB2IYuvEMOSTuBnvGKHam9lv92I-uJOrUi-jXxfvABF4pP5MncUv951AZ_YaAv0HEALw_wcB
- Badges
- Science topic
- Similar topics
- Engineering
- Materials Engineering
- Powders