i'm going to stack layer with spin coater in ito substrate.

ITO/WO3/NiO/Al (Al is deposited by thermal evaporation)

the solvent of NiO is ethanol. and as a result of my research, the solvent of WO3 is also ethanol.

i'm worried that NiO layer maybe affect WO3 layer.

( when NiO is spin coated, WO3 melts in the upper layer solvent)

i want to know

1. a condition where the down-layer is not affected by the up-layer.

2. To deposite WO3, what the other methode is there?

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