i'm going to stack layer with spin coater in ito substrate.
ITO/WO3/NiO/Al (Al is deposited by thermal evaporation)
the solvent of NiO is ethanol. and as a result of my research, the solvent of WO3 is also ethanol.
i'm worried that NiO layer maybe affect WO3 layer.
( when NiO is spin coated, WO3 melts in the upper layer solvent)
i want to know
1. a condition where the down-layer is not affected by the up-layer.
2. To deposite WO3, what the other methode is there?