when i research papers about inorganic HIL in QLED, i found some paper that use CuO, NiO.. transition metal oxide.
they have structure of ITO/TMO/PVK/QD/ZnO/Al and after TMO is coated in ITO, TMO layer is treated by O3-plasma or UV-ozone.
but they not explain why they use plasma or UV-ozone.
and i think the other papers that use TMO as HIL usually use TFB or poly-TPD as HTL.
i want to know the reason to do O3 treatment on TMO surface.