11 November 2018 5 4K Report

hi im studying inorganic material as HIL in OLED.

i sysnthesis NiO nanoparticles by was of solvothermal as HIL material. and i fabricated OLED devices that have the structure of ITO/NiO/PVK/QD/ZnO/Al.

but when i measured J-L-V, current density was so high 10~1000mA/cm^2 in 0~10V.

so i observed the characteristics of NiO nanoparticle.

at first, the result of AFM on NiO surface is that roughness RMS is about 4.2. the surface was so bad.

and to see the current characteristics, i fabricated ITO/NiO/Al.

inhere i found that current characteristics are non rectifying but not rectifying.

i think that this sturcture should have a rectifying property.

but i don't know why this structure have non-rectifying property.

the cause i think is aggregation of NiO nanoparticles.

As the particles aggregate with each other, NiO NPs lose property and the surface condition of NiO is bad.

is this correct?

if there is another reason, what is it?

is there anyone who have and had experience like this?

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