I want to do RF sputtering of ITO on glass substrate using magnetron sputtering. what thickness do i need to make it good conductive layer to use it for PSC. Moreover, whats about thickness of Al/Au as counter electrode in the same cell.
Dear Maria,
by my opionion there are two major issues to take into consideration: the current intensity you need to circulate on the coating and the surface roughness of the substrate.
In case of a smooth surface (approximately Ra less than a few tens of nanometers) and low current need, I think that 2-500 nm of coating could be sufficient to obtain a continuous and conductive layer. Be careful to build a compact coating by tuning the sputtering conditions and eventual ion bombardment if necessary otherwise the voids in the coating microstructure can strongly affect electrical properties. Best regards, Simone
Dear Maria Khalid ;
It depends on your requirements, what purpose you want to use it for? what resistivity range you would prefer? I think the normal thickness is
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