Dear Colleagues!

I am currently measuring the absorption of "absorbing thin films on non-absorbing substrate" type samples. The semiconductor material has a gap in the visible region and I am using a spectrophotometer. By comparing the measurement using 3 different manufacturers (Jasco, Scinco) I realize that the "critical information" (Band-Gap, absorption coefficient) comes out rather similar but the instruments differ quite much in terms of noise, baseline, shape of the baseline, etc.

I am therefore wondering if someone could recommend a more suitable setup for measuring the absorption that (at least partially) is less sensitive to the scattering. For example, photothermal deflection spectroscopy seems to suffer just as much from scattering in the lower end of the onset of absorption (in terms of energy), making it hard to properly determine the slope of the signal in this region (critical for the disorder energy - Urbach energy). 

ideally the setup would be able to better distinguish between scattering and absorption than commercial spectrophotometer do.

Your comments are very appreciated!

Yours,

Chris

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