When I examined the GIXRD data obtained recently, I observed that the sample treated with O2 plasma on the Cu surface deposited on Si chips showed increased intensity compared to the sample without plasma treatment. In this case, what does it mean that only the intensity of Cu increased without additional peaks from other substances? I want to understand why this happened, as there were no broad peaks from amorphous materials at the baseline to suggest that the increase in intensity was due to increased crystallinity.

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