I know that materials with high purity are used for the PVD processes. But I would like to know if there is a possibility to magnetron sputter with daily life alloys like AW-6060 Aluminium (+- 97.9 to 99.3% % of aluminium) or with E-CU / Cu ETP.
Ofcourse it will have another yield coefficient. Also the sputter power may change (DC or AC)...
But if it is possible what kind of effects will it give?
I am looking forword to you answers/recommendations.
Yes, technically it is possible. As far as I remember, AW6060 alloy contains a little bit of silicon and magnesium, the percentages of which will not be exactly kept in the deposit, but overall the sputtering should work.
Yes, it is possible to sputter Aluminum or Copper alloys. you have to try with Rf source at high working pressure.
Thomas Breuer
, Gaurav Malik and Gilles Poullain . First of all thanks for the answers.Will the sputtering process operate with DC-source? or is a RF-source a must for those alloys.
Kind regards,
Emre
Dear Dr. Kurtoglu,
You can perfectly do this. The coating will however contain all elements of the target.
Regards,
Paul Lippens
Ofcourse, you can sputter. The resulting composition of the films depend on the sputter yield of the elements of the target. RF is suggested.
All the best.
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