Dear
To test membrane fabrication (the number of samples for the original purpose is too small), I used samples which are thermal SiO2 300 nm/Si/thermal SiO2 300 nm window sample
I observed that membrane still alive after full etching of Si (I watched sliding of bubble)
However, I found that when I take out the sample (more exactly, after IPA rinse), the membrane region becomes empty.
My target membrane area is 5 mm x 5 mm (actually a few tens of um area membrane could be observed after rinsing)
In addition, I found that the surface becomes very dirty and some parts are cracked
Could you give me a piece of advice about these problems?
Thanks
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