Hi every one

I used the e-beam evaporation technique to deposit a layer of 200 nm of copper. However, after the deposition, many black dots (like the pinholes in SiN layer deposited by PECVD) have appeared. Do you have any idea what the problem would be and how to get rid of it?

Vaccum was 5e-6 mTorr, and the deposition rate was 2.5 A/s.

Many thanks for your suggestions in advance.

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