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Questions related from Milad Shojaeian
Hello, I want to pattern a thick layer of elastomer, preferably PDMS, with a thickness range of 500um to 1mm with rectangular pattern sizes of minimum 100*10 um^2 and maximum 1000*100 um^2. I...
07 December 2022 7,816 3 View
Hi every one I used the e-beam evaporation technique to deposit a layer of 200 nm of copper. However, after the deposition, many black dots (like the pinholes in SiN layer deposited by PECVD)...
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Hi, I deposited around 150nm Nickel on a silicon nitride layer, and I would like to know about the magnetization properties of the thin film (i.e Nickel). Would it be possible to do so by...
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A100nm of Chromium is used as a sacrificial layer which is to be removed in order to have a microcantilever suspended. However, after wet etching of Chromium, immersing in DI water, and drying by...
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