I've been trying the method described in :

Article Reliable Exfoliation of Large-Area High-Quality Flakes of Gr...

The process I'm doing now is:

  • Clean the SiO2/Si substrates with acetone, IPA and DI water;
  • Oxygen plasma for 4 minutes;
  • Put the tape with exfoliated graphene on top of the substrate;
  • Take substrate + tape to hot plate for 2min at 100ºC;
  • Take substrate out and gently press the tape;
  • Remove tape once at room temperature.
  • Unfortunately I've only been getting flakes of sizes around 10μm, not in the hundreds of um like the authors show. Any idea on how to increase the area of these monolayers?

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