I have silicon nanowires grown on silicon substrate. And I want to extract the nanowires from substrate to make it a substrate free nanowires. Can anyone help me with it?
Thank You
Hi. I would assume simple scratching or sonication method. Though I guess there should be more sophisticated techniques available out there.
@christine could you make it more clear. Did you mean to say directly peel of the grown portion and then in ethanol sonicate it?
Oh am not so sure. Have to look at the literature. However nanowires/tubes are usually removed in that manner. These are typical sample prep techniques for in microscopy. Saw this in lit using sonication in ethanol: Article Towards a full integration of vertically aligned silicon nan...
And also saw somebody used etching procedure:
https://www.nature.com/articles/srep03940
Good luck!
Smjruti,
If you do not need the wires etch silicon with a polishing solution such as an appropriate mixer of nitric acid, hydroflouric acid and acetric acid. For a suitable Si polishing solution please refer to the link: https://www.microchemicals.eu/technical_information/silicon_etching.pdf.
You can remove the nanowires by mechanical polishing using fine diamond paste before the mechanical etching.
Best wishes
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