Can anyone guide me cleaning process of the glass substrate? And what should be the pre-deposition rate before deposition in Vacuum thermal evaporation?
I don't know why in my attached samples, there is no uniformity...
The method you used is very common in a small research laboratory for a few samples cleaning.
The issue is if you don't move your samples quickly from one solvent to another, some stains could leave on the substrates, which could be very difficult to remove at the final stage of the cleaning process.
Once you use DI water cleaning, you have to make sure there are no moisture or water molecules left on your substrates. The notrogen gun blowing is not enough to remove all water on the substrates. If you don't have an oven, you could use a hot plate to heat up your substrates. During this process, you make sure the surface of the hot plate is clean. You could use Aluminium foil to protect your glass substrates by putting them on a hot plate.
The processed films should be up and the back of the glass substrates should contact on the surface of a hot plate. In this way, your processed films can avoid cross-contamination and the damages due to the contact on the hot plate surface. Hope it is clear.