I am looking at using Platinumised Silicon substrates for thin film deposition in a RF magnetron sputtering system. I am experienced in using this system for deposition on Silicon substrates. but this is my first time using Pt substrates
As this is my first time using these expensive substrates, I would like to request if there is any special preperations the substrates needs prior to deposition to get a good film, outside washing with acetone and IPA to remove surface contaminants.
Actually In sputtering method, whatever DC, Rf or magnetron configuration , there no special requirements or care for substrate unless if you heat your substrate during growth in this case the substrate should be stable at the heating temperature
you can use pt substrate without any problem,.
I do not think you need any other precautions than for the case without platinum.
Actually In sputtering method, whatever DC, Rf or magnetron configuration , there no special requirements or care for substrate unless if you heat your substrate during growth in this case the substrate should be stable at the heating temperature
you can use pt substrate without any problem,.
Ultrasonic the Pt substrates in a solution of Ammonia - you will use a 50/50 mix for the solution, Neutral Extran detergent (few drops) and deionized warm water for 10 minutes. Wash in deionized water followed by ultrasonication for more 10min. After washing blow the substrates in dried nitrogen gas or blow with a good filtered and dried compressed air from oil free compressors attached to cooling dehumidifier units.
Alternatively you may ultrasonicaly wash with Alcaline Extran solution followed by DI water rinsing, Isopropyl alcohol rinsing, again rinsing quickly with DI water followed by drying with N2 (or very good dried and oil free compressed air)
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