Favourable conditions of base pressure, rate of deposition.
Also, by which characterisation technique to be used to verify the thickness of the deposited film.
Dear Sneha Babu,
The rate is as slow as possible i.e. 0.01Astron. The base pressure is at least less than 10^-6 bar.
You have to use an AFM to verify the thickness since it is far too thin to use a surface profiler.
Hope it helps.
Dear Sneha,
Actually, I think may be it is difficult to accurately obtain such a thin MgO layer using thermal evaporation. You may need to try a lot to achieve high accuracy. I would suggest you to use the atomic layer deposition (ALD). As indicated by its name, the deposition rate is very low in ALD since the film is grown in the way of atom layer by atomic layer.
Hope this answer is helpful to you.
Thanks a lot.
Yang
Dear Sneha,
I doubt you can prepare MgO by thermal evaporation. You need to use e-beam evaporation in order to evaporarte the material with such high boiling point.
Regards,
Tomas
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