Hello,
Please let me know how to etch a 5-nm Ti thin Film deposited on NiO thin Film (20 nm).
Thanks in advance
Hello Alireza,
Could you simply try a diluted HF etch? Say: HF:H2O (1:10, vol.)?
The etch rate of the underlying NiO should be incrediblty slow compared to the Ti (approx. 1 µm.min^-1).
Jules.
Thanks Prateek,
Dear Hammond,
what is your suggestion for 5-nm Ti?
how long should I keep it in that solution?
Alireza,
15-20 s should be enough to completely remove 5 nm. I used this etchant to remove a similar thickness within a nanogap without issues.
Jules
HF is a very aggressive/dangerous acid. Can we avoid it in Ti-metal wet etching?
I would suggest you to use a very dilute HF based etchant to etch 5 nm of Ti. What I generally use to etch Ti is a mixture of HF:H2:O2:DI water in the ratio 1:1:20. Still it etches 50 nm of Ti in less than 5 sec..!! You could optimize the solution further for a slow etch rate.
Thanks,
Jose
http://transene.com/etchants/, choose the slowest one. For your thickness, diluting maybe needed. Good luck.
I've used "Titan-etch" before for this application, worked really well.
Good luck.
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