This is one of those gritty details that never makes it into a paper. I often use Amine-capped silanes (such as 3aminopropyltrimethoxysilane- APTMS) in hopes of constructing monolayers of gold nanoparticles on glass surfaces. After adding my APTMS, I know that it's a good idea to rinse the surface before annealing or other subsequent steps. I also know that it is thought that the layer is unstable before annealing. Therefore, is there an optimal way to rinse these without damaging the layer? Let's say I made a solution of 1% APTMS in ethanol, and have dipped slides in here. When I remove the slides, should I rinse with ethanol from a squirt bottle or submerge in fresh ethanol? Should I sonicate or is this potentially damaging to the layer (or will it actually benefit the layer)? I know that no one is likely to have studied this per se, but figured we all have our own niche protocols that work and any enlightening information would be highly welcome.
Thank you for your reply. I just wanted to add that both deposition of silanes and rinsing of silanes UNDER SONICATION helps tremendously. I must stress that deposition under sonication works great.
I've used ethanol or methanol to rinse any unreacted trimethoxysilane from glass surfaces. These alcohols are pretty weak nucleophiles so I wouldn't expect them to wreak havoc on the silane monolayer.
Thank you for your reply. I just wanted to add that both deposition of silanes and rinsing of silanes UNDER SONICATION helps tremendously. I must stress that deposition under sonication works great.
Hey Adam,
I am currently working with APTMS. Searching the literature I've also found that sonication is pretty much the way to go, but do you maybe know about the optimum time of sonication? I am just worried that if I don't sonicate it long enough, I won't achieve monolayer which is important in my work because I am supposed to perform another reaction with it. What is/was your usual procedure with this?
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