We use 20 nm colloidal silica as final step, but the results are not statisfying. The Kikuchi pattern is weak, the IQ is too low. Chemical etching works well, as You recommended. This is only a question, I would correlate the IQ obtained by etchng and polishing, and so on
Dear Mikhail, thanks for the advice. Can You guess the particle size of this product? And what about the diffraction pattern? It is strongly visible, easy to index?
I've been said to try dilute acid solution instead of water-only with silica as an compromise to pure chemical etching. Maybe you may try that one. As to purely mechanical process you really may try self-crushing abrasive on Al2O3 like car polish, but i doubt you will get better patterns as from silica.
Dear Adam, I don't know exactly particle size. We use three type of '3m' polish for samples of Zr alloys: 09374, 09375, 09376. All of them are water-based and each subsequent number has less grain