I deposit SiO2 thin films using magnetron sputter(RF power) and also found the target broke. Buying a new target is unavailable. The RF power sometimes break down when sputtering the material(Foward power is 0, and there is no plasma). I wonder whether the broken target affect the sputtering.
Chandra Bhal Singh
Use a copper plate where stick the broken target and again polish the target so that broken area have minimum exposure to plasma. The power suddenly breakdown to zero when when plasma strike to broken area of target as sparking occure at that area. Obviously , film quality will be affected if breakdown is frequent .
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