I had grown a metal oxide thin film on Si(100) using CVD technique. From SEM and AFM, the film shows island type growth, composed of various sized grains. Since the number of grains are different from area to area (for example 2x2 micrometer), the RMS value is changing. (we are using AFM-picoview software to measure RMS value)
So, How to report RMS roughness value of my thin film? OR Is there any other way to calculate surface roughness of my film?
I have very limited knowledge in this regard, so, please suggest me a specified way to determine surface roughness as accurate as possible.
Well, you just take the RMS value from the software. And use the scale showing the range. For instance if your roughness (rms) is 3.35 nm for a 2x2 um^2 image then the scale might be in the range of 0-10 nm.
One important thing is that, sometimes in between grains there is a deep valley and then the rms should be lower compared to what it is showing in the software.
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