Hi All,

I deposited SnO2 nanofibers on silicon wafer and tried to anneal them in air in a horizontal quartz tube furnace. At the end of annealing the nanofibrous membrane peel off from the Silicon substrate.

I have tried different flow rates and as low as 20 sccm of air and have also tried different heating ramp rates (10C/min, 5C/min and 2C/min) but the problem remains same in each case.

I can apply hot stamping (thermo compression method) but that changes the morphology of the nanofibers.

Can anyone suggest what should i do?