I am wondering whether the stronger solvents like NMP, PG remover AZ300T, Alleg380 (compared to acetone) can help removing the PMMA residue from CVD graphene surface after it is tranferred into SiO2/Si substrates.
Laxman Raju Thoutam
Try NEP as it removes the resist residues better than simple acetone. There is always a certain amount of residue present on the graphene. We can only reduce the amount of residue by opting different processing methods. Recently, a group used acetic acid for better removal of pmma than other solvents. You can find the paper at http://www.photonics.ethz.ch/fileadmin/user_upload/optics/pdf/Papers/her13a.pdf.
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