Could anyone tell me how to clean the surface of the ceramic substrates prior to depositing metals, where the substrate is patterned by the photoresist for lift-off? I am mainly concerned by some native Al2O3 on the substrate surface which may need to be removed through a wet-chemical cleaning technique. Usually, acids (e.g. HCl, HF) are used for this purpose as far as III-V semiconductors are concerned.  

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