For example, a cuboidal Silicon substrate with semi-cylindrical deposition on top if viewed in 3D. Can an omega shaped FinFeT be taken as a reference for such devices, where the ratio of the width and height of the omega fin may be equal, and half of it is deposited over Si?
Hello Rupam.
I think in the patent link below you can find the answer.
Remember, If you wish to use the process attached, you have to contact with patent authors. This is mandatory in all patents.
Enjoy.
Emilio Ramírez Juidías.
https://www.google.ch/patents/US6319790
Thank you, Sir. It is really helpful. Yes, I shall request permission from the authors. Do we need to take permission if we wish to cite it in a paper?
Sincerely, Rupam
If you wish to cite it in a paper, you don't need to take permission.
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