Depositing could be possible, if the ALD system is designed to continuously run for long enough period of time (a few days +/-, depending on the growth rate) and if adsorption of precursors on the deposited material works as well as it is on the original substrate. The question is - would thick film remain defect-free?

I completely agree with Valery. Technically it is possible; but ALD is mainly a technique for deposition of extremely thin films ( a few nm). It is a very slow process.

If you have the patience, a stable machine, and large enough precursor containers it should be possible. For instance see the following paper for a 4 um multilayer deposition process; http://www.sciencedirect.com/science/article/pii/S0304399111002130