Hello.
I'm going to electrdodeposit Nickel (Ni) on a substrate in nanoscale thickness.
I will use NiSO4, NiCl2, H3BO3 as electrolyte and constant current method in the two electrode system.
Is it possible to electrodeposit Nickel less than 20~50 nm thickness with uniform and porous structure?
If I can't achieve both structrues, uniform structure is preferred first.
What current denstiy (i.e, mA/cm2) is favorable?
How the current density affect the structure of electrodeposited Ni?
Can you recommend?
Thanks.
Dear Kang,
Yes, you can, it is deposited as a fine thin by changes in voltage with time ( take more time at nearly 60-70 volt) and the current density of the process is measured as an output of the circuit?
Dear Jihoon,
Ni can be deposited by chronoamperometry (fixed the current, you will get the potential vs time curve) or by chronopotentiometry (fixed the potential, you will get the current vs time curve). To get the desired thickness you can fixed the time.
You know your sample area and required thickness and can calculate how much mole Ni is required. then you can convert it into a charge in Coulomb and fixed that charge then you can use either chronoamperometry or chronopotentiometry to get the Ni film.
You can fixed the current density for example 40 mA/cm2 and then calculate the time to get required charge.
Best Regards,
Bapi
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