I have deposited amorphous silicon thin film (appx. 100 nm) using PVD technique. Initial deposition trials were on silicon substrate and hardly I could differentiate the colour of thin film and the substrate. To cross-check whether the deposition is happening, I have deposited the same on glass substrate. The film looked slightly brownish colour but was almost transparent. The deposition temperature was 200 degree Celsius. Anyone had the same experience?

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