I have deposited metal film on Si substrate and want to study the growth mode from HRTEM images. So how to identify or to be more specific how to differentiate between S-K growth (2D plus Island) and V-W growth (3-d island) from hrtem images?
investigations of directional growth from the crystaline symmetry of layered deposit material will help. You can obtain the information from the surface image
Growth of metal thin film on ultra-clean reconstructed Si(hkl) substrates, following the growth mode viz. ‘layer plus island’ or ‘island’ are extremely surface sensitive phenomena. Hence, it is better understood with the help of in-situ RHEED study. And RHEED observations are well supported by in-situ imaging with STM. As the grown specimens (after growing in UHV) are brought outside of the growth chamber, such information related to the top surface of the Si substrate is lost. So, with use of the cross section HRTEM method, it is very difficult to understand such aspects of growth.