How to get good and homogeneous layer of compact-TiO2 other than spray pyrolysis or expensive Atomic Layer Deposition in perovskite solar cell fabrication? We want full coverage of this compact blocking layer over the FTO to prevent short circuit with the HTM/Au and maximum thickness of 100nm? How to achieve that?
There are many possibilities for growing of TiO2 layer. They are, e.g., pulsed laser deposition (PLD), electron beam evaporation or sputtering methods.
Hello Mr. Mokhtar,
I think you can perform a combinatorial approach. As mentioned above, you can very well use EBE, PLD or sputtering, However, when it comes to circuit, shortings may happen due to lack of contact between islands of TiO2 particles. Similarly, I assume that you do not just want to prepare a layer of TiO2 but also study it's growth afftecting cell paramaters, hence, I would recommend, prepare thin layer of few nanometers of Ti onto FTO using any of the above methods, and control the growth by hydrothermal method using nutrient growth solution. This will prevent the shortings, enhance the light absoption, TIR may happen, better charge separation and ultimately enhanced cell paramaters.
All the best
Krishna
Dear Mr. Muhamad
I think you can use chemical bath deposition technique (CBD) to prepare thin layer of a few nanometers with good homogeneous and less pinholes to prevent short circuit for your prepared thin films.
With my best wishes
Dear Muhamad,
You need to read this paper which employed low temperature TiO2 and simple deposition method by spin coating. The PCE is above 20%.
Good luck.
Article Efficient and stable solution-processed planar perovskite so...
- Badges
- Science topic
- Similar topics
- Physical Sciences
- Materials Science
- Thin Films and Nanotechnology