I read few papers and concluded that 21o temperature of oven for 48-72 hours is suitable to dry leaves without damaging its chemical ingredients along with genetic materials.
When I used to work with leaves in one of my first jobs (to determine some physic-chemical characteristics), I used to dry it at room temperature for at least two days. So I agree with these studies that you mention. I would say that it is equally suitable for keeping DNA structure, too.
if you have the opportunity you better use silica gel to dry the material. It worksquite fast (e.g. overnight) and the DNA stays intact. You would have to invest in silicagel but you can re-use it by "backing" it in the oven at 120-130°C for about 5 hours.
Take some fresh leaves, put them in a tea bag (or smal envelope) and let them sit in about 10g of silicagel. This should do the trick.
I would like to thank your question. I have used liquid nitrogen for DNA isolation and is better to get more DNA yield not to face damage when dry your leaf. For that if you keep some fresh leaf at -80C