I treated Rice Husk by KOH, the treated rice husk XRD analysis showed higher intensity peak SiO2 than raw rice husk Whereas, alkaline treatment of rice husk decrease the amount of SiO2 in rice husk that it can see by XRF analysis.
I wonder if this alkaline treatment also reduced the presence of other elements that strongly abosrb the Si x-ray photons. Thus, it would be expected this peak to be higher in treated than untreated samples. It may be necessary to look at the entire composition of the samples.
I want to add few possibility regarding your problem:
1. From your XRD it is cleared that the background shift of both the peak is different i.e, 1: 3 or 1:4 ratio. So, the instrumental parameters must be different ( variation in its div. slit size, receiving slit size, or power of the X-ray source etc.). Please check the source of error.
2. After this correction, if still it is there, then is may be due to increase in its crystallinization because of interaction with KOH as shown in the paper. http://jes.ecsdl.org/content/147/6/2328.short