I need to mention the most important variables that must be carried out in the laboratory, such as pressure, temperature, current, voltage, and other influential parameters.
The effectiveness of plasma in preparing thin films can be increased by carefully optimizing spray parameters such as pressure, temperature, current, voltage, gas flow rate, spray distance, and substrate movement to control coating quality, adhesion, thickness, and microstructure.
To enhance plasma-assisted thin film deposition via spray methods, key parameters must be carefully optimized:
1- Spray Rate & Droplet Size: Control atomization to ensure uniform coverage and prevent oversaturation or voids.
2-Carrier Gas Flow & Pressure: Adjust to stabilize the plasma plume and improve particle transport.
3- Nozzle–Substrate Distance: Fine-tune to balance thermal impact and deposition uniformity.
4-Substrate Temperature: Crucial for film crystallinity, adhesion, and phase formation.
5-Solution Concentration & Viscosity: Tailor to avoid clogging and ensure consistent film thickness.
6- Spray Angle & Pattern: Optimize for even distribution and minimal overspray.
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