i want to etch the MgO nanowires from the silicon substrate deposited with cvd i need to transfer the naonwires to the glass subastrate to deposit electrode anyone can help please ?
You can use selective silicon etching which will etch silicon at the base of the nanowires and free the nanowires from the silicon substrate. Please search for such an etching solution. When you find it please tell us about it.
A simple method is to place the nanowire-decorated growth substrate in a liquid that does not attack the material (ethanol here, perhaps?) and use ultrasound to disperse the nanowires in the liquid. The nanowires can then be easily transferred by so-called drop-casting (random arrangement). If this does not work, I can recommend mechanical (dry) contact printing (please read our publications about this technique: surface controlled contact printing). You simply shear the growth and device substrate being in mechanical contact and transfer the nanowires by frictional forces. You don't need a printing device for this if you can live with lower reproducibility.
Pal, Biswajit, Kalyan Jyoti Sarkar, and Pallab Banerji. "Fabrication and studies on Si/InP core-shell nanowire based solar cell using etched Si nanowire arrays." Solar Energy Materials and Solar Cells 204 (2020): 110217.