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how can i measure the resistivity of the mgo nanowires deposited on the silicon substrate?
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i need to know the exact step size and scan speed for the MgO nanowires xrd deposited on the silicon susbtrate whenever i do xrd it just shows silicon peak and MgO peaks gets vanished at the end...
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i want to etch the MgO nanowires from the silicon substrate deposited with cvd i need to transfer the naonwires to the glass subastrate to deposit electrode anyone can help please ?
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