I'm fabricating CsSnBr3 perovskite thin film using spin-coating method.
I used CsSnBr3 in DMF solution and chlorobenzene was added as a anti-solvent method
After water, methanol and acetone cleaning glass substrates, to increase wettability between DMF and glass substrates, uv-ozone treatment was performed 15minutes.
But fabricated film is too thin and I couldn't find any absorbance spectra peaks.
By decreasing to 1500rpm it looks dark brown but still not uniform and no xrd peaks.
In this view, I'm considering oxygen plasma treatment to increase the wettability DMF and substrates. I guess it's not common to do it for perovskite film instead of UV-ozone treatment.
Please teach me appropriate condition of oxygen plasma treatment to replace uv-ozone. Or is there any other method to increase wettability?
please refer to the attached experimental details