Trying to obtain micron thick isotopically labeled graphite. It seems CVD processes exhibit fine control of the concentration of 13C in the product, but most literature is centered around nanoscale films.
Does anyone here have experience with, or can link to any literature for producing >1 micron thick graphite through CVD?
For Chemical Vapour Deposition? getting one micron would require a lot of time and a lot of gas flow, so I dont think it is feasible. We would use in my PhD and PD lab, for nanoscale films, and eching for micron
It seems that the earlier literature on the topic has some information regarding thick growth and pyrolytic graphite is certainly commercially available within the mm thickness domain.
Article A Technique for Efficiently Converting 13CH4 into Pyrolytic 13C
Main difference between thick and thin film production seems to be centered around the deposition temperatures. Lot of the early literature seems to be grown in the 2100C range. Not always the easiest to sort through 1950's and 60's documents though.
I understood this question as you want to use CVD to produce micron thick graphite? Sean Clark the article you point out is not CVD process.
Bit confused as to why this wouldn't classify as thermal CVD. Heat a substrate, pump in some precursor, heat breaks down the gas and deposits/grows the desired material. Isn't that in essence the process of CVD?
based on Figures in the paper, as in the attachment, it reminds me combustion chamber for inorganic char production.
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