I am currently working on some magnetic multilayer stacks. I am thinking if it could be possible to grow magnetic layers on top of a TiN seed layer. Usually I use TaPt as my seed layer.
I can do room temperature sputtering deposition and directly deposit TiN (non-reactive) on to thermally oxidized silicon wafer. Could someone give some insight into this?
Thanks!
Vadim S. Gorshkov
Thank you for your answer! I guess I might need to specify some conditions. I am probably depositing TiN with only 3~10 nm and I would prefer not to break vacuum during my deposition.
Hi Vadim,
In our clean room facility. We can do sputtering deposition with pure TiN target. The base pressure could go down to 2~3 x 10^-7 Torr.
I most of the Ti-based hard PVD coating, a Ti-layer is used as the bond layer. Here area few examples:
Article Effect of Target Frequency, Bias Voltage and Bias Frequency ...
https://link.springer.com/content/pdf/10.1007/s00170-012-4360-4.pdf
Article Effect of deposition parameters on TiAlNcoating using pulsed DC CFUBMS
I have not come across the use of TiN as the seed layer. Having said that, if we are depositing TiN-CrN multi-layer coating, typically it is initially Ti bond layer on the substrate followed by TiN and then CrN - and then it is repeated.
Article Influence of titanium foliar application on antioxidant enzy...
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