14 September 2020 12 6K Report

I want to ask about Atomic Force Microscopy(AFM) tricky(?) things,

I measured the same sample 2 times, similar position in the AFM.

The sample is thin film made by evaporating on Si wafer.

It looked so uniform But I got different results whenever i measured.

As you can see the image,

In the 1st result, I saw very smooth surface,

But In the 2nd result, It was more rough than 1st time.

So i did to measured the surface 3rd time.

the result was same as 1st time...

I was so confuse So i want to ask your opinion about the reason of this situation

I thought the reason why the results are different whenever i did is that sample surface is not uniform.

But I couldn't accept that because the surface looked like so flat...

May i ask you that the reason why results are different? (another factor could be effected? )

Thank you for reading

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