I want to ask about Atomic Force Microscopy(AFM) tricky(?) things,
I measured the same sample 2 times, similar position in the AFM.
The sample is thin film made by evaporating on Si wafer.
It looked so uniform But I got different results whenever i measured.
As you can see the image,
In the 1st result, I saw very smooth surface,
But In the 2nd result, It was more rough than 1st time.
So i did to measured the surface 3rd time.
the result was same as 1st time...
I was so confuse So i want to ask your opinion about the reason of this situation
I thought the reason why the results are different whenever i did is that sample surface is not uniform.
But I couldn't accept that because the surface looked like so flat...
May i ask you that the reason why results are different? (another factor could be effected? )
Thank you for reading