18 November 2015 4 6K Report

Greatings everyone, we've been troubled by the phenomena stated in the topic. Our goal is to co-deposited CZTSe thin film, by the means

of thermal PVD, each element has thier own crucible, heating coil and temperature monitor. After the deposition rate of zinc stabilizes,

we open the shutter shielding the substrate, deposition starts; then, deposition rate of zinc decrease rapidly, often from 20 A/sec down to

5~6 A/sec. However, this only happens to zinc, other elements have no such problem. We'd appreciate a clear answer, advises also

greatly welcomed. Thank you!

*parameters: multi-source chamber, background vacuum 2×10^-6 torr, zinc temperature 170C, stabilizing time after target temperature 30min.

---------------2015/11/21 reply-----------------

Thank you so much for your replies!

to Stephan Harrer:

We check our crucibles along with ingredients they contained every time we take them down from the chamber, everything looks right, no

contamination; we've not yet measure film thickness, for the reason that we don't thick measuring it under unstable deposition rate is meaningful.

to Joel De Jesus:

This instability of deposition rate occurred to zinc exclusively, other elements all have stable deposition rate, and film thickness are as

calculated. We've not remove the substrate shutter yet, not before we figured out what really cause it.

However, I think there might be a possibility that the monitor was overwhelmed by overflowing particles. We'll look into that.

to Ata H Khalid:

We didn't apply boat or quartz tube design in our experiments, but like Mr.Jesus stated, there is a chance that thickness monitor reporting

incorrectly can be the reason. Thank you!

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