I have samples of ZnO thin films, I will irradiated by O2 plasma cleaning, I would like to take XPS measurement before and after Plasma irradiation, my question
which kind of information we would like to receive from the XPS experiments
we did some xps measurements for the characterization of sputtered ZnO thin films. enclosing a copy of the paper, in which you may find some useful information.
K. Sreenivas
X-ray Photoelectron Spectroscopy (XPS) is a surface analysis technique. To XPS can be used to determine which elements are present in the material’s surface with their chemical states.
There are number of basic Books and litratures are available on the internet.
One of my paper on ZnO thin film is attached below.
Article Doping Induced Modifications in the Electronic Structure and...
X-ray Photoelectron Spectroscopy (XPS) is the most widely used technique for surface characterization. XPS provides an informations about chemical composition of surface.From the binding energy and intensity of a photoelectron peak ,the quantitative and qualitative elemental analysis and chemical bonding can be determined.
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