I want to coat the Al electrode layer (of about 50nm) on PVDF thin film (having thickness 150um) for nanogenerator application. What should be the process parameters for that?
It very much depends on your thermal evaporator. The vacuum level has to be as low as 1×10E-6 mbar. The evaporation rate should be low at the beginning and then fast to avoid the heating your substrates too much. It is a quite standard procedure to do thermal evaporation.
It is a system-dependent case. Different evaporators offer different holders like molybdenum boat or tungsten basket. They have different resistance and boiling points.
In a HIND HIVAC vacuum coating unit for 99.99% pure Al, if a molybdenum boat is used, about 80 A current provides a very slow, but steady coating, which may result a 50 nm metal deposition within a few seconds. The pressure must be smaller than 10-5 torr.
Quartz crystal resonators should be used to optimize the deposition-rate. Also the substrate should be rotated continuously to ensure uniform deposition.
Doberdò, Italo, Nicholas Löffler, Nina Laszczynski, Dario Cericola, Nerino Penazzi, Silvia Bodoardo, Guk-Tae Kim, and Stefano Passerini. "Enabling aqueous binders for lithium battery cathodes–Carbon coating of aluminum current collector." Journal of power sources 248 (2014): 1000-1006.
thanks, Xuhua Wang Azeez Abdullah Barzinjy Souvik Bhattacharjee for ur valuable info
Suggest the following paper:
https://link.springer.com/article/10.1007/s11085-016-9657-5
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