I am using reactive dc magnetron sputtering and substrates are glass, acrylic. desity was lower on glass.
dear kumar the substrate effect on the deposition thin film
also depend on band gap of substrate and lattice mismatch
Could you give more details about the deposited films? What is the thickness of your samples? Do they have similar morphology and structure? How did you determine the density?
Have a look on the nicely written review article :
From nucleation to nanowires: a single-step process in reactive plasmas. Nanoscale, 2010, 2, 2012–2027 by Ostrikov group.
It can be due to tensile or compressive strain induced on the film by the substrate. Hexagonal ZnO grow with the c axis perpendicular to the substrate, even for amorphous substrates as SiO2/Si(001) or glass, you can find a certain texture. In this last case, strain is observed as grain growth is achieved after nucleation. You can see which planes are submitted to tensile strain by XRD. Shift lo the left indicate tensile strain, which normaly is compensated to a right shift of some other peaks
Does the deposition involves heating, there might be some differences in temperature depends on the substrate material
There is no heating involved. thickness is around 150-200 nm in both cases.
Should be a problem related to crystallographic orientation of substrate grains nature.
How much is the difference in density you have found? Did you compare the density of films in the same substrate? How much is the experimental dispersión found in this last case?
As there is two different substrate. the grain size of them must be different.Depending upon the distribution of grains on the surface the density may vary.So it is essential to know the quality of substrate ,its grain size and distribution.
i deposited both substrates in one run. the variation within the samples of same substrate was very low. I used triplicates of each substrate to analyse the difference between the mean. the difference was statistically significant.
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