What is the best method to prepare the multi elemental (ALLOYS) and the single elemental thin films on substrate?
What is mean't by multi elemental? If that is a single element layer or multilayers (involving more than one element) then there are many methods available like thermal evaporation, ebeam evaporation, sputtering etc. If one consider thin film of an alloy then sputtering or PLD would give better results due to better compositional homogeniety through the thickness of the film compared to ebeam or thermal evaporation. Of course there are other methods available for obtaining a thin film. The thin film characteristics would depend upon different factors like the nature and temperature of the substrate, deposition methods and process parameters and thickness of the film.
I think there is no best method. Each method has its advantage depending on the actual goal, this may be the quality of the deposited film, the simplicity, the price and the apparatus needed, the size of the substrate that can be coated, the thickness of the layers, etc etc. So be more precise with your question!
Dirk
There are various techniques available to grow thin films viz. physical vapor deposition (PVD)], chemical vapor deposition (CVD), and electrochemical deposition methods.Each method has its advantage and disadvantage. The selection of techniques are used as they are suitable for different thin film layer deposition.
Thin films of single element can be prepared by simple thermal evaporation technique. However,in case of alloys, flash evaporation technique or sputtering technique should be used for better stoichiometry.
- Badges
- Science topic
- Similar topics
- Chemistry
- Nanotechnology
- Nanostructures
- Thin Films